Xm-semi (Jiaxing) Semiconductor Technology Co., Ltd.

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Semiconductor material additive

Special surfactant for wafer cleaning

TSC-1: General EO (ethylene oxide, - (CH2CH2O) n -) has a structure of 20mol and is highly hydrophilic.
The metal is refined to prevent contamination and achieve high purity specifications.
TSC-S: Because of its special phenolic EO, it is more hydrophilic than TSC-1.
Achieve the expected higher level (about 3 times of TSC-1)
PC-DH2: Compared with TSC-1 · TSC-S, it has lower foaming rate and prevents spots caused by microbubbles.
The metal is refined to prevent contamination and achieve high purity specifications.
  • Product Details
● Product line



● Main effects



● Characteristics of each product
TSC-1: General EO (ethylene oxide, - (CH2CH2O) n -) has a structure of 20mol and is highly hydrophilic.
The metal is refined to prevent contamination and achieve high purity specifications.
TSC-S: Because of its special phenolic EO, it is more hydrophilic than TSC-1.
Achieve the expected higher level (about 3 times of TSC-1)
PC-DH2: Compared with TSC-1 · TSC-S, it has lower foaming rate and prevents spots caused by microbubbles.
The metal is refined to prevent contamination and achieve high purity specifications.


● Product delivery standard



● Product inclusion specification ①



● Products included in specifications ②